Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same

ABSTRACT

Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.

This is a Divisional of application Ser. No. 13/630,622 filed Sep. 28,2012, claiming priority based on Japanese patent application No.2012-170911, filed on Aug. 1, 2012 and Japanese patent application No.2011-212207, filed on Sep. 28, 2011, the disclosures of which areincorporated herein in their entirety by reference.

TECHNICAL FIELD

This invention relates to a mask blank glass substrate, a multilayerreflective film coated substrate, a mask blank, and a mask which areadapted for use in the manufacture of semiconductor devices or the like,and further relates to methods of manufacturing the same.

BACKGROUND ART

Generally, fine pattern formation is carried out by the photolithographyin the manufacture of a semiconductor device. A number of transfer maskscalled photomasks are normally used for such fine pattern formation. Thetransfer mask comprises generally a transparent glass substrate havingthereon a fine pattern made of a metal thin film or the like. Thephotolithography is used also in the manufacture of the transfer mask.

In the manufacture of a transfer mask by the photolithography, use ismade of a mask blank having a thin film (e.g. a light-shielding film (anopaque film)) for forming a transfer pattern (mask pattern) on atransparent substrate such as a glass substrate. The manufacture of thetransfer mask using the mask blank comprises a writing process ofwriting a required pattern on a resist film formed on the mask blank, adeveloping process of, after the writing, developing the resist film toform a resist pattern, an etching process of etching the thin film usingthe resist pattern as a mask, and a process of stripping and removingthe remaining resist pattern. In the developing process, a developer issupplied after writing the required pattern on the resist film formed onthe mask blank to dissolve a portion of the resist film soluble in thedeveloper, thereby forming the resist pattern. In the etching process,using the resist pattern as a mask, an exposed portion of the thin film,where the resist pattern is not formed, is removed by dry etching or wetetching, thereby forming a required mask pattern on the transparentsubstrate. In this manner, the transfer mask is produced.

As a type of transfer mask, a phase shift mask is known apart from aconventional binary mask having a light-shielding film pattern made of achromium-based material on a transparent substrate. The phase shift maskis configured to have a phase shift film on a transparent substrate. Thephase shift film is adapted to provide a predetermined phase differenceand is made of, for example, a material containing a molybdenum silicidecompound. Further, use has also been made of a binary mask using, as alight-shielding film, a material containing a metal silicide compoundsuch as a molybdenum silicide compound.

In recent years, with higher integration of semiconductor devices,patterns finer than the transfer limit of the photolithography using theconventional ultraviolet light have been required in the semiconductorindustry. In order to enable formation of such fine patterns, the EUVlithography being an exposure technique using extreme ultraviolet(hereinafter referred to as “EUV”) light is expected to be promising.Herein, the EUV light represents light in a wavelength band of the softX-ray region or the vacuum ultraviolet region and, specifically, lighthaving a wavelength of about 0.2 nm to 100 nm. As a mask for use in theEUV lithography, there has been proposed a reflective mask in which amultilayer reflective film for reflecting exposure light is formed on asubstrate and an absorber film for absorbing exposure light is formed ina pattern on the multilayer reflective film.

With the increasing demand for miniaturization in the lithographyprocess as described above, problems in the lithography process arebecoming remarkable. One of them is a problem about defect informationof a substrate for a mask blank for use in the lithography process.

Conventionally, taking the center of a substrate as the origin (0,0),the existing position of a defect of the substrate is specified by thedistance from the origin (0,0) in a mask blank inspection or the like.As a consequence, the position accuracy is low and thus, when patterninga thin film for pattern formation (hereinafter referred to as a“pattern-formation thin film”) while avoiding the defect at the time ofpattern writing, it is difficult to avoid it on the order ofmicrometers. Therefore, the defect is avoided by changing the directionof pattern transfer or roughly shifting the pattern transfer position onthe order of millimeters.

Under these circumstances, for the purpose of enhancing the inspectionaccuracy of a defect position, there have been several proposals, forexample, to form a fiducial mark on a substrate for a mask blank and tospecify a position of a defect using the fiducial mark as a referenceposition.

WO2008/129914 (Patent Document 1) discloses that, in order to accuratelyspecify a position of a minute defect having a sphere-equivalentdiameter of about 30 nm, at least three marks having a sphere-equivalentdiameter of 30 nm to 100 nm are formed on a film-forming surface of asubstrate for a reflective mask blank for EUV lithography. On the otherhand, JP-A-2003-248299 (Patent Document 2) discloses that a fiducialmark in the form of pits is provided on a surface of a transparentsubstrate.

SUMMARY OF THE INVENTION

It is possible to enhance the inspection accuracy of a defect positionof a mask blank by the method disclosed in Patent Document 1 or 2.However, according to such a conventional method, a fiducial mark isformed by digging down a substrate (generally a glass substrate) for amask blank and, therefore, for example, in the case of a mask blankwhose surface defect is found after forming a pattern-formation thinfilm on the substrate or in the case of a transfer mask which isproduced using a mask blank and in which a pattern defect that isdifficult to correct is found, it is difficult to reuse or recycle thesubstrate by stripping and removing the thin film from the substratewithout discarding the mask blank or the transfer mask as a defective.In recent years, price competition for electronic components such assemiconductor devices has intensified more and more and thus it hasbecome important to suppress the manufacturing cost of transfer masks.In this connection, reuse or recycling of substrates has becomeimportant. Further, in recent years, with the miniaturization ofpatterns in semiconductor devices or the like, high-precision andhigh-quality transfer masks have been required and thus, in mask blanksfor manufacturing such transfer masks, high-value-added expensivesubstrates have often been used. Accordingly, also in this connection,in order to suppress the manufacturing cost of the transfer masks, ithas become important to recycle the substrates.

As the substrate for the EUV reflective mask, a material having a lowthermal expansion coefficient, such as a SiO₂—TiO₂-based glass, is usedin order to prevent distortion of a pattern due to heat in exposure.With such a glass material, it is difficult to achieve high smoothnesssuch as a surface roughness of 0.1 nm or less in RMS (root mean squareroughness) by precision polishing. As a consequence, if a fiducial markis formed directly on the surface of the substrate made of such a glassmaterial, there arises a problem that when a highly sensitive defectinspection apparatus is used, background noise due to the surfaceroughness becomes large, resulting in an increase in false defectdetection.

This invention has been made in view of the above-mentioned conventionalproblems and it is an object of this invention to provide a mask blankglass substrate and a multilayer reflective film coated substrate thatcan each suppress false defect detection in a highly sensitive defectinspection apparatus to thereby enhance the detection accuracy of adefect position or the like using a fiducial mark as a reference andthat each enable recycling of a glass substrate included therein, andfurther to provide methods of manufacturing them.

It is another object of this invention to provide a mask blank and amask each using such a mask blank glass substrate or such a multilayerreflective film coated substrate and further to provide methods ofmanufacturing such a mask blank and such a mask.

As a result of intensive studies to achieve the above-mentioned objects,the present inventor has found out that if an underlayer is formed on amain surface of a glass substrate on which a transfer pattern is to beformed, so as to reduce surface roughness of the main surface of theglass substrate or to reduce defects of the main surface of the glasssubstrate, and if a fiducial mark which provides a reference for adefect position in defect information is formed on this underlayer, itis possible to suppress false defect detection and thus to enhance thedetection accuracy of a defect position or the like regardless of theglass composition of the glass substrate. The present inventor has alsofound that, by forming the fiducial mark on such an underlayer, it ispossible to recycle the glass substrate afterwards.

As a result of further intensive studies based on the elucidated factdescribed above, the present inventor has completed this invention.

Specifically, in order to achieve the above-mentioned objects, thisinvention has the following structures.

(Structure 1)

A mask blank glass substrate, comprising a glass substrate having a mainsurface on which a transfer pattern is to be formed, an underlayer thatis formed on the main surface to reduce a surface roughness of the mainsurface of the glass substrate or to reduce defects of the main surfaceof the glass substrate and that has a precision-polished surface, and afiducial mark formed on the underlayer to provide a reference for adefect position in defect information.

As recited in Structure 1, on the main surface, on the side where thetransfer pattern is to be formed, of the glass substrate, the underlayerserving to reduce the surface roughness of the main surface of the glasssubstrate or to reduce the defects of the main surface of the glasssubstrate is formed, and the surface of the underlayer is theprecision-polished surface. In other words, a surface of the underlayerhas an underlayer surface roughness smaller than a main surfaceroughness of the main surface of the glass substrate. Therefore, thesurface of the underlayer has high smoothness. Since the fiducial markwhich provides the reference for the defect position in the defectinformation is formed on this underlayer having the high surfacesmoothness, it is possible to reduce background noise due to the surfaceroughness and thus to suppress false defect detection in a highlysensitive defect inspection apparatus and, as a result, it is possibleto improve the detection accuracy of a defect position or the like usingthe fiducial mark as the reference. Further, since the fiducial mark isformed on the underlayer, in the case of a mask blank whose surfacedefect is found after forming a pattern-formation thin film on theunderlayer or in the case of a transfer mask which is produced using amask blank and in which a pattern defect that is difficult to correct isfound, it is possible to recycle the glass substrate by stripping andremoving the thin film and the underlayer from the glass substratewithout discarding the mask blank or the transfer mask as a defective.

(Structure 2)

The mask blank glass substrate according to Structure 1, wherein theunderlayer is made of Si or a silicon compound containing Si.

As recited in Structure 2, since the material of the underlayer is Si orthe silicon compound containing Si, the underlayer has translucency forKrF excimer laser light (wavelength: 248 nm) or ArF excimer laser light(wavelength: 193 nm). Therefore, the mask blank glass substrateaccording to Structure 2 is suitable as a glass substrate for a mask towhich such laser light is applied as exposure light. Further, if asurface of a thin film made of Si or a silicon compound containing Si isprecision-polished with a polishing liquid containing abrasive particlessuch as colloidal silica, extremely high smoothness can be obtainedrelatively easily. Accordingly, Structure 2 is preferable also in thisrespect.

(Structure 3)

The mask blank glass substrate according to Structure 1, wherein theunderlayer is made of a material that is etchable by the use of achlorine-based gas.

(Structure 4)

The mask blank glass substrate according to Structure 3, wherein theunderlayer is made of Al, Ta, Zr, Ti, Cr, or a material containing atleast one of them.

As recited in Structure 3, when the underlayer is made of the materialthat can be removed by etching with the chlorine-based gas which giveslittle damage to the glass substrate, the underlayer can be stripped andremoved from the glass substrate without giving damage to the glasssubstrate, which is thus preferable for recycling of the glasssubstrate.

As the material that can be removed by etching with the chlorine-basedgas, it is preferable to use, for example, Al, Ta, Zr, Ti, Cr, or thematerial containing at least one of them as recited in Structure 4.

(Structure 5)

The mask blank glass substrate according to any one of Structures 1 to4, wherein the glass substrate is made of a SiO₂—TiO₂-based glass or amulticomponent glass-ceramic.

As recited in Structure 5, in the case where the glass substrate is madeof the SiO₂—TiO₂-based glass or the multicomponent glass-ceramic, highsurface smoothness of the mask blank glass substrate is obtained whenthe underlayer serving to reduce the glass substrate surface roughnessor to reduce the glass substrate surface defects is formed on the mainsurface of the glass substrate.

(Structure 6)

A multilayer reflective film coated substrate, wherein a multilayerreflective film adapted to reflect EUV light is formed on the underlayerof the mask blank glass substrate according to any one of Structures 1to 5.

Since the multilayer reflective film adapted to reflect the EUV light isformed on the underlayer of the mask blank glass substrate having theabove-mentioned structure, there is obtained the multilayer reflectivefilm coated substrate that is formed with the fiducial mark, that hashigh surface smoothness, and that enables recycling of the glasssubstrate.

That is, since the multilayer reflective film is formed on theunderlayer serving to reduce the glass substrate surface roughness or toreduce the glass substrate surface defects and having high surfacesmoothness, a surface of the multilayer reflective film can also obtainhigh smoothness. Therefore, there is obtained the multilayer reflectivefilm coated substrate that can suppress false defect detection in adefect inspection of the surface of the multilayer reflective film tothereby enhance the detection accuracy of a defect position or the likeusing the fiducial mark as the reference.

(Structure 7)

A mask blank, wherein a thin film to be a transfer pattern is formed onthe underlayer of the mask blank glass substrate according to any one ofStructures 1 to 5 or on the multilayer reflective film of the multilayerreflective film coated substrate according to Structure 6.

Since the thin film to be the transfer pattern is formed on theunderlayer of the mask blank glass substrate having the above-mentionedstructure or on the multilayer reflective film of the multilayerreflective film coated substrate having the above-mentioned structure,there is obtained the mask blank that is formed with the fiducial mark,that has high surface smoothness, and that enables recycling of theglass substrate.

That is, since the thin film to be the transfer pattern is formed on theunderlayer serving to reduce the glass substrate surface roughness or toreduce the glass substrate surface defects and having high surfacesmoothness (on the multilayer reflective film in the case of themultilayer reflective film coated substrate of Structure 6), a surfaceof the thin film to be the transfer pattern can also obtain highsmoothness. Therefore, there is obtained the mask blank that cansuppress false defect detection in a defect inspection of the surface ofthe thin film to be the transfer pattern to thereby enhance thedetection accuracy of a defect position or the like using the fiducialmark as the reference.

(Structure 8)

A mask, wherein the thin film of the mask blank according to Structure 7is patterned.

When a pattern defect that is difficult to correct is found, the mask ofStructure 8 enables recycling of the glass substrate by stripping andremoving the thin film and the underlayer from the glass substrate(including the multilayer reflective film in the case of the multilayerreflective film coated substrate of Structure 6).

(Structure 9)

A method of manufacturing a mask blank glass substrate, comprising: asurface machining step of carrying out surface machining so that a mainsurface of a glass substrate has a predetermined flatness;

an underlayer forming step of forming an underlayer on the main surfaceof the glass substrate, the underlayer serving to reduce surfaceroughness of the main surface of the glass substrate or to reducedefects of the main surface of the glass substrate;

a precision polishing step of carrying out precision polishing so that asurface of the underlayer has a predetermined surface roughness; and

a fiducial mark forming step of forming a fiducial mark on theunderlayer, the fiducial mark providing a reference for a defectposition in defect information.

According to the mask blank glass substrate manufacturing method ofStructure 9, on the main surface, on the side where a transfer patternis to be formed, of the glass substrate, it is possible to form theunderlayer serving to reduce the surface roughness of the main surfaceof the glass substrate or to reduce the defects of the main surface ofthe glass substrate and having high surface smoothness, and the fiducialmark which provides the reference for the defect position in the defectinformation is formed on this underlayer. Therefore, it is possible toreduce background noise due to the surface roughness and thus tosuppress false defect detection in a highly sensitive defect inspectionapparatus and, as a result, it is possible to improve the detectionaccuracy of a defect position or the like using the fiducial mark as thereference. Further, since the fiducial mark is formed on the underlayer,in the case of a mask blank whose surface defect is found after forminga pattern-formation thin film on the underlayer or in the case of atransfer mask which is produced using a mask blank and in which apattern defect that is difficult to correct is found, it is possible torecycle the glass substrate by stripping and removing the thin film andthe underlayer from the glass substrate without discarding the maskblank or the transfer mask as a defective.

(Structure 10)

The method according to Structure 9, wherein the fiducial mark formingstep is carried out after the precision polishing step.

As recited in Structure 10, it is preferable to carry out the fiducialmark forming step after the precision polishing step in terms of thecontrol of the shape of the fiducial mark and the suppression of defectoccurrence. That is, since the fiducial mark forming step is carried outafter the precision polishing step, there is no possibility ofdegradation of the cross-sectional shape of the fiducial mark.Therefore, there is no possibility of a reduction in contrast bydetection light when detecting the fiducial mark. After the precisionpolishing step, a cleaning step is normally carried out for the purposeof removing abrasive particles used in the precision polishing step.Since the cleaning step is carried out before the fiducial mark formingstep, the surface, where the fiducial mark is to be formed, of theunderlayer is smooth and thus it is possible to prevent the occurrenceof a new defect due to residue of the abrasive particles.

(Structure 11)

The method according to Structure 10, further comprising a defectinspection step of carrying out a defect inspection of the underlayerbetween the precision polishing step and the fiducial mark forming step.

(Structure 12)

The method according to Structure 11, wherein measurement data of thedefect inspection includes the size and number of defects and, as aresult of the defect inspection, the glass substrate with the underlayerjudged to be successful is subjected to the fiducial mark forming stepwhile the glass substrate with the underlayer judged to be unsuccessfulis subjected to defect correction, repolishing of the surface of theunderlayer, or recycling of the glass substrate by stripping theunderlayer.

By providing the defect inspection step of carrying out the defectinspection of the underlayer between the precision polishing step andthe fiducial mark forming step as recited in Structure 11, it ispossible to carry out, for example, as recited in Structure 12, thedefect correction, the repolishing of the surface of the underlayer, orthe recycling of the glass substrate by stripping the underlayer for theglass substrate with the underlayer judged to be unsuccessful as aresult of the defect inspection before forming the fiducial mark.

(Structure 13)

A method of manufacturing a multilayer reflective film coated substrate,comprising a multilayer reflective film forming step of forming amultilayer reflective film, adapted to reflect EUV light, on theunderlayer of the mask blank glass substrate obtained by the methodaccording to any one of Structures 9 to 12.

By forming the multilayer reflective film adapted to reflect the EUVlight on the surface of the underlayer of the mask blank glass substratehaving the above-mentioned structure, there is obtained the multilayerreflective film coated substrate that is formed with the fiducial mark,that has high surface smoothness, and that enables recycling of theglass substrate.

That is, since the multilayer reflective film is formed on theunderlayer serving to reduce the glass substrate surface roughness or toreduce the glass substrate surface defects and having high surfacesmoothness, a surface of the multilayer reflective film can also obtainhigh smoothness. Therefore, there is obtained the multilayer reflectivefilm coated substrate that can suppress false defect detection in adefect inspection of the surface of the multilayer reflective film tothereby enhance the detection accuracy of a defect position or the likeusing the fiducial mark as the reference.

(Structure 14)

A method of manufacturing a mask blank, comprising atransfer-pattern-formation thin film forming step of forming a thin filmto be a transfer pattern on the underlayer of the mask blank glasssubstrate obtained by the method according to any one of Structures 9 to12 or on the multilayer reflective film of the multilayer reflectivefilm coated substrate obtained by the method according to Structure 13.

By forming the thin film to be the transfer pattern on the underlayer ofthe mask blank glass substrate having the above-mentioned structure oron the multilayer reflective film of the multilayer reflective filmcoated substrate having the above-mentioned structure, there is obtainedthe mask blank that is formed with the fiducial mark, that has highsurface smoothness, and that enables recycling of the glass substrate.

That is, since the thin film to be the transfer pattern is formed on theunderlayer serving to reduce the glass substrate surface roughness or toreduce the glass substrate surface defects and having high surfacesmoothness (on the multilayer reflective film in the case of themultilayer reflective film coated substrate obtained by Structure 13), asurface of the thin film to be the transfer pattern can also obtain highsmoothness. Therefore, there is obtained the mask blank that cansuppress false defect detection in a defect inspection of the surface ofthe thin film to be the transfer pattern to thereby enhance thedetection accuracy of a defect position or the like using the fiducialmark as the reference.

(Structure 15)

A method of manufacturing a mask, comprising patterning the thin film ofthe mask blank obtained by the method according to Structure 14.

When a pattern defect that is difficult to correct is found, the maskobtained by Structure 15 enables recycling of the glass substrate bystripping and removing the thin film and the underlayer from the glasssubstrate (including the multilayer reflective film in the case of themultilayer reflective film coated substrate obtained by Structure 13).

(Structure 16)

A mask manufacturing method comprising carrying out a defect inspectionof the multilayer reflective film coated substrate obtained by themethod according to claim 13 by using as the reference the fiducial markformed on the underlayer, and manufacturing a mask based on a result ofthe defect inspection.

The mask manufacturing method according to Structure 16 makes itpossible to obtain a defect free mask by manufacturing masks through thestep of collating the result of the defect inspection with predetermineddrawing data (mask pattern data) previously designed on the basis of afiducial mark and the step of correcting the drawing data so that anadverse influence due to the defect can be reduced. Moreover, when themask obtained in the above-mentioned manner is set onto an exposureapparatus and is used to perform pattern transcription onto a resistfilm formed on a semiconductor substrate, it is possible to realizeoutstanding pattern transcription without any pattern defect resultingfrom any defect of the mask.

(Structure 17)

A mask blank substrate comprising a substrate that has a main surfacewith a main surface roughness, an underlayer that is contacted with themain surface and that has an underlayer surface roughness smaller thanthe main surface roughness, and a fiducial mark located on theunderlayer to provide a reference for a defect position in defectinformation.

(Structure 18)

A multilayer reflective film coated substrate, wherein a multilayerreflective film that reflects EUV light and that is contacted with thesurface of the underlayer of the mask blank substrate according toStructure 17.

(Structure 19)

A mask blank comprising a thin film for forming a transfer pattern, thatis located on the underlayer of the mask blank substrate according toStructure 17 or that is located on the multilayer reflective film of themultilayer reflective film coated substrate according to Structure 18.

(Structure 20)

A mask comprising a transfer pattern that is located on the underlayerof the mask blank substrate according to Structure 17 or that is locatedon the multilayer reflective film of the multilayer reflective filmcoated substrate according to Structure 18.

According to this invention, it is possible to provide a mask blankglass substrate and a multilayer reflective film coated substrate havinga multilayer reflective film on the mask blank glass substrate that caneach suppress false defect detection in a highly sensitive defectinspection apparatus to thereby enhance the detection accuracy of adefect position or the like using a fiducial mark as a reference andthat each enable recycling of a glass substrate included therein, andfurther to provide methods of manufacturing them.

Further, according to this invention, it is possible to provide a maskblank and a mask each using such a mask blank glass substrate or such amultilayer reflective film coated substrate, thus, each capable ofsuppressing false defect detection in a highly sensitive defectinspection apparatus to thereby enhance the detection accuracy of adefect position or the like using a fiducial mark as a reference andeach enabling recycling of a glass substrate included therein, andfurther to provide methods of manufacturing such a mask blank and such amask.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plan view of a mask blank glass substrate showing an exampleof the arrangement of fiducial marks;

FIG. 2 is a diagram showing examples of the shapes of the fiducialmarks;

FIG. 3 is a cross-sectional view of a mask blank glass substrateaccording to an embodiment of this invention;

FIG. 4 is a cross-sectional view of a multilayer reflective film coatedsubstrate according to an embodiment of this invention;

FIG. 5 is a cross-sectional view of a reflective mask blank according toan embodiment of this invention;

FIG. 6 is a cross-sectional view of a binary mask blank according to anembodiment of this invention;

FIG. 7 is a cross-sectional view of a reflective mask according to anembodiment of this invention;

FIG. 8 is a cross-sectional view of a binary mask according to anembodiment of this invention;

FIG. 9 is a flowchart for explaining a mask blank glass substratemanufacturing method of this invention;

FIG. 10 is a flowchart for explaining a surface machining process in themask blank glass substrate manufacturing method of this invention;

FIG. 11 is a diagram showing a schematic structure of a DC magnetronsputtering apparatus;

FIG. 12 is an exemplary diagram for explaining the positionalrelationship between a sputtering target and a substrate; and

FIG. 13 is a conceptual diagram of a film forming apparatus for ion-beamsputtering.

DESCRIPTION OF THE EMBODIMENTS

Hereinbelow, embodiments of this invention will be described in detail.

[Mask Blank Glass Substrate]

First, a mask blank glass substrate according to this invention will bedescribed.

The mask blank glass substrate according to this invention is such thatan underlayer is formed on a main surface, on the side where a transferpattern is to be formed, of a glass substrate, the underlayer serving toreduce surface roughness of the main surface of the glass substrate orto reduce defects of the main surface of the glass substrate, a surfaceof the underlayer is a precision-polished surface, and a fiducial markwhich provides a reference for a defect position in defect informationis formed on the underlayer.

FIG. 3 is a cross-sectional view of a mask blank glass substrateaccording to an embodiment of this invention.

In FIG. 3, a mask blank glass substrate 20 comprises a glass substrate11 and an underlayer 21 formed on a main surface, on the side where atransfer pattern is to be formed, of the glass substrate 11. A fiducialmark 22 in the form of a recess is formed on the underlayer 21 such thatthe fiducial mark 22 does not reach the glass substrate 11.

By forming a thin film to be a transfer pattern on a surface of theunderlayer 21 of the mask blank glass substrate 20, a mask blank forexposure is obtained. Specifically, the mask blank may be a binary maskblank having a light-shielding film on the surface of the underlayer 21,a phase shift mask blank having a phase shift film or a phase shift filmand a light-shielding film on the surface of the underlayer 21, or thelike. As exposure light, KrF excimer laser light or ArF excimer laserlight may be used, for example.

On the other hand, by forming a multilayer reflective film adapted toreflect EUV light on the surface of the underlayer 21 of the mask blankglass substrate 20, a multilayer reflective film coated substrate isobtained. If an absorber layer adapted to absorb the EUV light is formedas a thin film to be a transfer pattern on this multilayer reflectivefilm, a reflective mask blank for EUV exposure is obtained.

When the glass substrate 11 is used for the binary mask blank or thephase shift mask blank, there is no particular limitation as long as ithas transparency at an exposure wavelength to be used and use may bemade of, for example, a synthetic quartz substrate or one of variousother glass substrates such as a soda-lime glass substrate or analuminosilicate glass substrate. Among them, the synthetic quartzsubstrate is particularly preferable because it has high transparency atthe wavelength of ArF excimer laser light or in a shorter wavelengthregion.

In the case of the reflective mask blank for EUV exposure, in order toprevent distortion of a pattern due to heat in exposure, use ispreferably made of, as the glass substrate 11, a material having a lowthermal expansion coefficient in a range of 0±1.0×10⁻⁷/° C., morepreferably in a range of 0±0.3×10⁻⁷/° C. As the material having the lowthermal expansion coefficient in this range, it is possible to use, forexample, a SiO₂—TiO₂-based glass or a multicomponent glass-ceramic.

The main surface, on the side where the transfer pattern is to beformed, of the glass substrate 11 is machined to have high flatness interms of ensuring at least high pattern transfer accuracy and highpattern position accuracy. The surface machining process will bedescribed later. For example, in the case of the mask blank for KrFexcimer laser exposure or ArF excimer laser exposure, the flatness ispreferably 0.3 μm or less and particularly preferably 0.1 μm or less ina 142 mm×142 mm region of the main surface, on the side where thetransfer pattern is to be formed, of the glass substrate 11.

In the case of the reflective mask blank for EUV exposure, the flatnessis preferably 0.1 μm or less and particularly preferably 0.05 μm or lessin a 142 mm×142 mm region of the main surface, on the side where thetransfer pattern is to be formed, of the glass substrate 11. A mainsurface, on the side opposite to the side where the transfer pattern isto be formed, of the glass substrate 11 is a surface which iselectrostatically chucked when the mask blank is set in an exposureapparatus. The flatness of this main surface is 1 μm or less, preferably0.5 μm or less in a 142 mm×142 mm region.

In this invention, the surface roughness required as a glass substratefor a mask blank is finally adjusted by the surface roughness of thesurface of the underlayer 21, but, in consideration of the influence onthe surface of the underlayer 21, the surface roughness of the mainsurface, on the side where the transfer pattern is to be formed, of theglass substrate 11 is preferably 0.3 nm or less in RMS.

The underlayer 21 is formed for the purpose of reducing the surfaceroughness of the main surface of the glass substrate 11 or reducingdefects of the main surface of the glass substrate 11. As a material ofsuch an underlayer 21, use is made of a material having translucency forexposure light in the case of use for the binary mask blank or the phaseshift mask blank. For example, in the case of the mask blank for KrFexcimer laser exposure or ArF excimer laser exposure, use is preferablymade of Si or a silicon compound containing Si (e.g. SiO₂ or SiON).

In the case of the reflective mask blank for EUV exposure, theunderlayer 21 does not need to have translucency for exposure light anduse is preferably made of a material that can obtain high smoothnesswhen the surface of the underlayer 21 is precision-polished and that isexcellent in defect quality. In terms of high smoothness, the underlayer21 is preferably made of a material having a high film density and/or anamorphous structure. For example, Si or a silicon compound containing Si(e.g. SiO₂ or SiON) is preferably used because high smoothness isobtained when precision-polished and the defect quality is excellent. Siis particularly preferable. In particular, a Si film formed by ion-beamsputtering is preferable.

In terms of recycling of the glass substrate 11, it is preferable toselect, as the material of the underlayer 21, a material that can beremoved by etching with an etchant which gives little damage to theglass substrate 11, i.e. which has etching selectivity, specificallywith a chlorine-based gas. As the material that can be removed byetching with the chlorine-based gas, it is preferable to use, forexample, Al, Ta, Zr, Ti, Cr, or a material containing at least one ofthose elements (e.g. a compound containing one of the elements andfurther containing oxygen, nitrogen, or carbon). In terms of highsmoothness, it is more preferable that the underlayer 21 be made of amaterial having a high film density and/or an amorphous structure. Al,Ta, Zr, Ti, Cr, or the material containing at least one of the metalelements cited above may contain boron (B). Among them, the materialcontaining the metal element and nitrogen is preferable because highsmoothness can be obtained. In particular, Ta, Cr, or its nitride (TaN,TaBN, CrN, CrBN) is preferable.

It is important that the surface of the underlayer 21 beprecision-polished so as to have a surface roughness which is requiredas a substrate for a mask blank. This is because it is possible toreduce background noise due to the surface roughness and thus tosuppress false defect detection in a highly sensitive defect inspectionapparatus and, as a result, it is possible to improve the detectionaccuracy of a defect position or the like using the fiducial mark 22 asa reference. It is preferable to select a material of the underlayer 21and precision-polish the surface of the underlayer 21 so that itssurface roughness in RMS becomes 0.15 nm or less, particularlypreferably 0.1 nm or less, and further preferably 0.08 nm or less. Inconsideration of the influence on the surface of the multilayerreflective film which is formed on the underlayer 21, it is preferableto select a material of the underlayer 21 and precision-polish thesurface of the underlayer 21 so that the ratio of Rmax (maximum surfaceroughness, namely, surface roughness in maximum height)/RMS becomes 2 to10 and particularly preferably 2 to 8.

In this invention, the underlayer is not necessarily a single layer andmay have a laminated structure of different materials.

The thickness of the underlayer is properly set mainly in terms offiducial mark formation, fiducial mark identification, productivity, andso on. In the case where a fiducial mark having a concave or convexcross-sectional shape is formed, the thickness of the underlayer ispreferably set in a range of 20 nm to 300 nm in terms of theabove-mentioned aspects. At least the multilayer reflective film and theabsorber layer are formed on the underlayer in the reflective mask blankfor EUV exposure while the light-shielding film, the phase shift film,or the like is formed on the underlayer in the mask blank for KrFexcimer laser exposure or ArF excimer laser exposure. Therefore, takinginto account that the concave or convex fiducial mark can be identifiedin such a mask blank, the thickness of the underlayer is preferably in arange of 75 nm to 300 nm and more preferably in a range of 100 nm to 300nm.

Next, the fiducial mark which provides a reference for a defect positionin defect information will be described in detail.

In this invention, the fiducial mark is formed on the underlayer anddoes not reach the glass substrate. Herein, “the fiducial mark does notreach the glass substrate” means that trace of the formation of thefiducial mark is not substantially formed on the main surface of theglass substrate. Herein, “trace of the formation of the fiducial mark isnot substantially formed on the main surface of the glass substrate”includes a case where trace of the formation of the fiducial mark isformed on the main surface of the glass substrate to a degree that doesnot require machining to remove a certain amount of the main surface ofthe glass substrate in order to remove the trace of the formation of thefiducial mark. For example, in the case of a concave fiducial mark, themaximum depth of the fiducial mark is equal to the thickness of theunderlayer. Since the fiducial mark is formed on the underlayer, thereis the advantage that, as described above, the glass substrate can berecycled.

The fiducial mark provides a reference for a defect position in defectinformation of the mask blank glass substrate or the mask blank. Theshape and size of such a fiducial mark are not particularly limited aslong as it can be recognized for an electron beam in electron-beamwriting or inspection light of a defect inspection apparatus, and areproperly set. In FIG. 3, as one example, there is formed the fiducialmark 22 which has a concave cross-sectional shape and which can berecognized by providing a required depth in its height direction.

When the fiducial mark is recognized by providing the required depth orheight level difference in its height direction (i.e. the thicknessdirection of the underlayer), the cross-sectional shape of the fiducialmark is not limited to the concave shape as shown in FIG. 3 and may be aconvex shape, a combination of concave and convex shapes, or the like.When the fiducial mark is recognized by providing optical contrast, itscross-sectional shape is not necessarily the above-mentioned concave orconvex shape and, for example, may be substantially flat.

FIG. 1 is a plan view of a mask blank glass substrate showing an exampleof the arrangement of fiducial marks and FIG. 2 is a diagram showingexamples of the shapes of the fiducial marks.

In FIG. 1, two kinds of marks, i.e. relatively large rough alignmentmarks 12 a and relatively small fine marks 12 b, are formed as fiducialmarks. Although the fiducial marks are shown on a main surface of aglass substrate 11 in FIG. 1, this does not mean that the fiducial marksare formed directly on the glass substrate. FIG. 1 only shows theexample of the arrangement of the fiducial marks over the main surfaceof the glass substrate. In this invention, the fiducial marks are formedon the underlayer.

The fine mark 12 b has a role of a fiducial mark which provides areference for a defect position in defect information of a mask blankglass substrate or a mask blank while the rough alignment mark 12 aitself has no role of a fiducial mark, but serves to facilitatedetection of the position of the fine mark 12 b. Since the size of thefine mark 12 b is small, it is difficult to locate the position of thefine mark 12 b by visual observation. On the other hand, if an attemptis made to detect the fine mark 12 b using an electron beam orinspection light from the beginning, the detection takes time and, thus,if a resist film is formed, there is a possibility of causing unwantedresist exposure, which is thus not preferable. By providing the roughalignment mark 12 a whose positional relationship with the fine mark 12b is determined in advance, the fine mark 12 b can be detected quicklyand easily.

FIG. 1 shows the example in which the rough alignment marks 12 a arearranged at four positions near corners of the main surface of therectangular glass substrate 11 and the fine marks 12 b are arranged attwo positions near each of the rough alignment marks 12 a. The roughalignment marks 12 a and the fine marks 12 b are preferably formed on aboundary line of a pattern forming region, defined by a broken line A,of the substrate main surface or on the outer peripheral side outsidethe pattern forming region. However, if it is too close to the outerperipheral edge, it may be a region where the flatness of the substratemain surface is poor or there is a possibility of crossing another kindof identification mark, which is thus not preferable.

In the example shown in FIG. 1, the rough alignment marks 12 a and thefine marks 12 b each have a cross shape. The size and width of the mark,the depth of the mark when it has a concave shape, and so on can bearbitrarily set as long as it can be recognized for an electron beam inelectron-beam writing or inspection light of a defect inspectionapparatus. Specifically, in FIG. 2, in the case of the rough alignmentmark 12 a, a dimension x1 in the x-direction and a dimension y1 in they-direction can each be set to 0.55 mm, the line width of the crossshape can be set to 5 μm, and the depth of the cross shape can be set to100 nm, while, in the case of the fine mark 12 b, a dimension x2 in thex-direction and a dimension y2 in the y-direction can each be set to 0.1mm, the line width of the cross shape can be set to 5 μm, and the depthof the cross shape can be set to 100 nm. Further, in FIG. 2, a distancex3 in the x-direction between the centers of the rough alignment mark 12a and the fine mark 12 b and a distance y3 in the y-direction betweenthe centers of the rough alignment mark 12 a and the fine mark 12 b caneach be set to 1.5 mm.

The shapes and arrangement of the fiducial marks shown in FIGS. 1 and 2are only one specific example and this invention is not limited thereto.The rough alignment marks 12 a are not essential and only the fine marks12 b may be sufficient.

The mask blank glass substrate of this invention described above is suchthat, on the main surface, on the side where the transfer pattern is tobe formed, of the glass substrate, the underlayer serving to reduce thesurface roughness of the main surface of the glass substrate or toreduce the defects of the main surface of the glass substrate is formed,and the surface of the underlayer is the precision-polished surface.Therefore, the surface of the underlayer has high smoothness. Since thefiducial mark which provides the reference for the defect position inthe defect information is formed on this underlayer having the highsurface smoothness, it is possible to reduce background noise due to thesurface roughness and thus to suppress false defect detection in ahighly sensitive defect inspection apparatus and, as a result, it ispossible to improve the detection accuracy of a defect position or thelike using the fiducial mark as the reference. Further, since thefiducial mark is formed on the underlayer, in the case of a mask blankwhose surface defect is found after forming a pattern-formation thinfilm on the underlayer or in the case of a transfer mask which isproduced using a mask blank and in which a pattern defect that isdifficult to correct is found, it is possible to recycle the glasssubstrate by stripping and removing the thin film and the underlayerfrom the glass substrate without discarding the mask blank or thetransfer mask as a defective.

[Mask Blank Glass Substrate Manufacturing Method]

Next, a description will be given of a method of manufacturing the maskblank glass substrate described above.

This invention also provides the mask blank glass substratemanufacturing method.

The mask blank glass substrate manufacturing method of this inventioncomprises

a surface machining process of carrying out surface machining so that amain surface of a glass substrate has a predetermined flatness,

an underlayer forming process of forming an underlayer on the mainsurface of the glass substrate, the underlayer serving to reduce surfaceroughness of the main surface of the glass substrate or to reducedefects of the main surface of the glass substrate,

a precision polishing process of carrying out precision polishing sothat a surface of the underlayer has a predetermined surface roughness,and

a fiducial mark forming process of forming a fiducial mark on theunderlayer, the fiducial mark providing a reference for a defectposition in defect information.

FIG. 9 is a flowchart for explaining the mask blank glass substratemanufacturing method of this invention and FIG. 10 is a flowchart forexplaining the surface machining process in the mask blank glasssubstrate manufacturing method of this invention. A description will begiven with reference to these figures.

<Surface Machining Process>

The surface machining process comprises Preparation Process (P−1) ofpreparing a glass substrate, Profile Measurement Process (P−2) ofmeasuring the convex/concave profile of a glass substrate surface,Flatness Control Process (P−3) of controlling the flatness of the glasssubstrate surface by local machining, Cleaning Process (P−4) of cleaningthe glass substrate surface, and Finish Polishing Process (P−5) offinish-polishing the glass substrate surface (see FIG. 10).

[Preparation Process]

The preparation process is a process of preparing a glass substratewhose one or both surfaces are precision-polished to a surface roughnessof about 0.4 nm or less in RMS. Normally, this preparation processcomprises a rough polishing process of rough-polishing both surfaces ofthe glass substrate and a precision polishing process ofprecision-polishing one or both surfaces of the rough-polished glasssubstrate so that stepwise polishing is carried out. In this event, inthe rough polishing process, use is made of, for example, a polishingagent in which cerium oxide having a relatively large abrasive particlesize is dispersed, while, in the precision polishing process, use ismade of, for example, a polishing agent in which colloidal silica havinga relatively small abrasive particle size is dispersed.

[Profile Measurement Process]

The profile measurement process is a step of measuring theconvex/concave profile (flatness) of the surface of the glass substrateprepared in the preparation process. An optical interferometer isnormally used for measuring the convex/concave profile (flatness) of theglass substrate surface. The optical interferometer may be, for example,a fringe observation interferometer or a phase shift interferometer.Profile measurement results measured by the optical interferometer arestored in a recording medium such as a computer.

Then, the profile measurement results and a predetermined referencevalue (required flatness) are compared with each other by an arithmeticprocessing means such as a computer and the difference is calculated perpredetermined region (e.g. 5 mm×5 mm region) of the glass substratesurface. That is, a machining allowance is set according to the heightof a convex portion of the glass substrate surface. This difference(machining allowance) is set as a required removal amount of eachpredetermined region in local surface machining.

[Flatness Control Process]

The flatness control process is a process of locally machining theconvex portion per predetermined region under a machining conditionaccording to the machining allowance set by the arithmetic processingdescribed above, thereby controlling the flatness of the glass substratesurface at the predetermined value or less.

As a local surface machining method, use can be made of an MRF(magnetorheological finishing) method which brings a magnetic polishingslurry containing abrasive particles in an ion-containing magnetic fluidinto local contact with a glass substrate surface. Other than the MRFmethod, use may be made of a local machining method using GCIB (gascluster ion beam) or plasma etching.

[Cleaning Process]

A glass substrate cleaning method is not particularly limited. However,when the MRF method is used in the flatness control process, there is acase where the iron component contained in the magnetic fluid is,although a little, adhering to the glass substrate surface, andtherefore, it is preferable to carry out acid cleaning using, forexample, hydrochloric acid, thereby dissolving and removing the ironcomponent adhering to the glass substrate surface.

As a cleaning method, it is optional to use a dipping method that dips aglass substrate in a cleaning bath, a method that supplies a cleaningliquid to a glass substrate surface using a nozzle, or the like.Further, according to need, the cleaning performance may be enhanced byapplying ultrasonic wave or carrying out scrub cleaning.

[Finish Polishing Process]

When surface roughening or formation of a modified layer due tomachining occurs on the glass substrate surface in the above-mentionedflatness control process, finish polishing is carried out for thepurpose of removing them. Accordingly, if there is no such occurrence onthe glass substrate surface, the finish polishing is not necessarilycarried out.

As a method of this finish polishing, it is preferable to use apolishing method that can improve the surface roughness whilemaintaining the flatness obtained in the flatness control process. Forexample, there can be cited a method that carries out precisionpolishing with a polishing liquid while a surface of a polishing toolsuch as a polishing pad is in contact with a glass substrate mainsurface, a non-contact polishing method (e.g. float polishing or EEM(elastic emission machining)) that carries out polishing by the actionof a machining liquid interposed between a glass substrate main surfaceand a polishing tool surface while both are not in direct contact witheach other, or the like.

<Underlayer Forming Process>

An underlayer forming method is not particularly limited. For example,there can be cited DC sputtering, RF sputtering, ion-beam sputtering, orCVD. The material of an underlayer is as described before.

Particularly, in this invention, it is preferable to form an underlayerwhich is uniform in the substrate plane while maintaining high flatnessobtained in the above-mentioned surface machining process. For example,when forming an underlayer by sputtering using a film forming apparatusas shown in FIG. 11, it is preferable to provide a positionalrelationship between a substrate and a target as shown in FIG. 12.

FIG. 11 shows the structure of a general DC magnetron sputteringapparatus. The apparatus has a film forming chamber (vacuum vessel) 1 inwhich a magnetron cathode 2 and a substrate holder 3 are disposed. Asputtering target 5 bonded to a backing plate 4 is attached to themagnetron cathode 2. A glass substrate 6 is placed on the substrateholder 3. The film forming chamber 1 is evacuated by a vacuum pumpthrough an exhaust port 7. After an atmosphere in the film formingchamber 1 reaches a predetermined vacuum degree, a film forming gas isintroduced into the film forming chamber 1 through a gas inlet port 8and a negative voltage is applied to the magnetron cathode 2 using a DCpower supply 9, thereby carrying out sputtering. The pressure in thefilm forming chamber 1 is measured by a pressure gauge 10.

As shown in FIG. 12, the substrate 6 and the sputtering target 5 aredisposed so that facing surfaces thereof have a predetermined angletherebetween. Specifically, the target 5 is disposed at a position wherea straight line passing through the center of the target 5 and parallelto the central axis of the substrate 6 is offset by a predetermineddistance from the central axis of the substrate 6, and faces afilm-forming surface of the substrate 6 so as to be inclined by apredetermined angle with respect to the film-forming surface of thesubstrate 6. A thin film (underlayer) is formed by sputtering the target5 while horizontally rotating the substrate 6 with its film-formingsurface facing upward. The inclination angle of the target 5 ispreferably set to, for example, about 10 to 30 degrees. The distance(offset distance) between the central axis of the substrate 6 and thestraight line passing through the center of the target 5 and parallel tothe central axis of the substrate 6 is preferably set to, for example,about 200 mm to 350 mm. Further, the vertical distance between thetarget 5 and the substrate 6 is preferably set to, for example, about200 mm to 380 mm.

When forming an underlayer by ion-beam sputtering, it is preferable todefine a relationship in terms of an incident angle with respect to anormal of a substrate main surface as shown in FIG. 13.

FIG. 13 is a conceptual diagram of a film forming apparatus 80 forion-beam sputtering. In FIG. 13, there is shown an incident angle α ofsputtering particles 84 with respect to a normal 85 of a main surface ofa substrate 6 in ion-beam sputtering. The incident angle α of thesputtering particles 84 is preferably set to 5 to 80 degrees. Thesputtering particles 84 are generated when an ion beam 83 emitted froman ion-beam generating apparatus 81 is incident on a sputtering target82. The substrate 6 is placed with its film-forming surface facing thesputtering target 82 so that the incident angle α of the sputteringparticles 84 falls within the above-mentioned angle range. An underlayeris formed by ion-beam sputtering while rotating the substrate 6.

When forming the underlayer by sputtering such as DC magnetronsputtering or ion-beam sputtering, by setting the positionalrelationship between the substrate and the target or the incident angleα of the sputtering particles as shown in FIG. 12 or 13, it is possibleto reduce variation in film thickness in the substrate plane to therebyform the uniform underlayer while maintaining high flatness obtained inthe above-mentioned surface machining process.

<Underlayer Precision Polishing Process>

As a method of this underlayer precision polishing, use is made of apolishing method that can improve the surface roughness whilemaintaining the flatness obtained in the above-mentioned surfacemachining process. For example, there can be cited a method that carriesout precision polishing with a polishing liquid while a surface of apolishing tool such as a polishing pad is in contact with a glasssubstrate main surface, a non-contact polishing method (e.g. floatpolishing or EEM (elastic emission machining)) that carries outpolishing by the action of a machining liquid interposed between a glasssubstrate main surface and a polishing tool surface while both are notin direct contact with each other, or the like.

In the underlayer precision polishing process, precision polishing iscarried out so that the underlayer has underlayer surface roughnesssmaller than main surface roughness of the glass substrate.Specifically, the precision polishing is performed so that theunderlayer surface is not greater than 0.15 nm in RMS (root mean squareroughness), preferably, not greater than 0.1 nm in RMS, and morepreferably, not greater than 0.08 nm in RMS.

In order to obtain high smoothness, it is preferable to carry outprecision polishing using a colloidal silica slurry in which the averageparticle size of a polishing abrasive is 100 nm or less, preferably 50nm or less.

<Fiducial Mark Forming Process>

Details of the shapes, sizes, and so on of fiducial marks to be formedon the underlayer are as described before.

A fiducial mark forming method is not particularly limited. For example,when the cross-sectional shape of a fiducial mark is concave as shown inFIG. 3, the fiducial mark can be formed by photolithography, recessformation by laser light or an ion beam, machining trace by scanning adiamond stylus, indention by a micro-indenter, stamping by an imprintmethod, or the like. When the cross-sectional shape of a fiducial markis convex, the fiducial mark can be formed by partial film formation byFIB (focused ion beam), sputtering, or the like.

In terms of the fiducial mark shape control, the fiducial mark formingprocess is preferably carried out after the above-mentioned underlayerprecision polishing process.

<Underlayer Defect Inspection Process>

In this invention, the defect inspection process which carries out adefect inspection of the underlayer is preferably provided between theabove-mentioned underlayer precision polishing process and theabove-mentioned fiducial mark forming process.

The defect inspection of the underlayer can be carried out using ageneral defect inspection apparatus. When carrying out the defectinspection, measurement data of the defect inspection preferablyincludes the size and number of defects. As a result of the defectinspection, the glass substrate with the underlayer judged to besuccessful is subjected to the above-mentioned fiducial mark formingprocess. On the other hand, for the glass substrate with the underlayerjudged to be unsuccessful, it is preferable to selectively carry outdefect correction when a defect is correctable, repolishing of thesurface of the underlayer, or recycling of the glass substrate bystripping the underlayer (an underlayer will be formed again).

As described above, according to the mask blank glass substratemanufacturing method of this invention, on the main surface, on the sidewhere a transfer pattern is to be formed, of the glass substrate, it ispossible to form the underlayer serving to reduce the surface roughnessof the main surface of the glass substrate or to reduce the defects ofthe main surface of the glass substrate and having high surfacesmoothness, and the fiducial mark which provides the reference for thedefect position in the defect information is formed on this underlayer.Therefore, it is possible to reduce background noise due to the surfaceroughness and thus to suppress false defect detection in a highlysensitive defect inspection apparatus and, as a result, it is possibleto improve the detection accuracy of a defect position or the like usingthe fiducial mark as the reference. Further, since the fiducial mark isformed on the underlayer, in the case of a mask blank whose surfacedefect is found after forming a pattern-formation thin film on theunderlayer or in the case of a transfer mask which is produced using amask blank and in which a pattern defect that is difficult to correct isfound, it is possible to recycle the glass substrate by stripping andremoving the thin film and the underlayer from the glass substratewithout discarding the mask blank or the transfer mask as a defective.

[Multilayer Reflective Film Coated Substrate]

As shown in FIG. 4, this invention also provides a multilayer reflectivefilm coated substrate 30 in which a multilayer reflective film 31adapted to reflect EUV light is formed on the surface of the underlayer21 of the mask blank glass substrate 20 having the above-mentionedstructure.

The multilayer reflective film 31 adapted to reflect the EUV light isformed on the surface of the underlayer 21 of the mask blank glasssubstrate 20 having the above-mentioned structure. As a consequence,there is obtained the multilayer reflective film coated substrate 30that is formed with the fiducial mark 22, that has high surfacesmoothness, and that enables recycling of the glass substrate 11.

The multilayer reflective film 31 is a multilayer film in which lowrefractive index layers and high refractive index layers are alternatelylaminated. Generally, use is made of a multilayer film in which thinfilms of a heavy element or its compound and thin films of a lightelement or its compound are alternately laminated by about 40 to 60cycles.

For example, as a multilayer reflective film for EUV light having awavelength of 13 nm to 14 nm, use is preferably made of a Mo/Si cyclemultilayer film in which Mo films and Si films are alternately laminatedby about 40 cycles. Other than this, as a multilayer reflective film foruse in a region of EUV light, there is a Ru/Si cycle multilayer film, aMo/Be cycle multilayer film, a Mo compound/Si compound cycle multilayerfilm, a Si/Nb cycle multilayer film, a Si/Mo/Ru cycle multilayer film, aSi/Mo/Ru/Mo cycle multilayer film, a Si/Ru/Mo/Ru cycle multilayer film,or the like. The material may be properly selected according to anexposure wavelength.

[Mask Blank]

This invention also provides a mask blank in which a thin film to be atransfer pattern is formed on the underlayer of the mask blank glasssubstrate having the above-mentioned structure or on the multilayerreflective film of the multilayer reflective film coated substratehaving the above-mentioned structure.

Since the thin film to be the transfer pattern is formed on theunderlayer of the mask blank glass substrate having the above-mentionedstructure or on the multilayer reflective film of the multilayerreflective film coated substrate having the above-mentioned structure,there is obtained the mask blank that is formed with the fiducial mark,that has high surface smoothness, and that enables recycling of theglass substrate.

The above-mentioned multilayer reflective film coated substrate can beused as a substrate for a reflective mask blank which is adapted for usein the manufacture of a reflective mask, that is, which comprises, inorder, on a substrate, a multilayer reflective film adapted to reflectexposure light and an absorber film for pattern formation adapted toabsorb the exposure light.

FIG. 5 shows a reflective mask blank 40 in which a protective film(capping layer) 32 and an absorber film 41 for pattern formation adaptedto absorb EUV light are formed in this order on the multilayerreflective film 31 of the multilayer reflective film coated substrate 30of FIG. 4. On the side, opposite to the side where the multilayerreflective film and so on are formed, of the glass substrate 11, aback-side conductive film 42 is provided.

The absorber film 41 has the function of absorbing exposure light suchas EUV light and is preferably made of, for example, tantalum (Ta) aloneor a material composed mainly of Ta. As the material composed mainly ofTa, use is made of a material containing Ta and B, a material containingTa and N, a material containing Ta and B and further containing at leastone of 0 and N, a material containing Ta and Si, a material containingTa, Si, and N, a material containing Ta and Ge, a material containingTa, Ge, and N, or the like.

Normally, for the purpose of protecting the multilayer reflective film31 in patterning the absorber film 41 or in pattern correction, theprotective film 32 or a buffer film is provided between the multilayerreflective film 31 and the absorber film 41. As a material of theprotective film 32, use is made of silicon, ruthenium, or a rutheniumcompound containing ruthenium and at least one of niobium, zirconium,and rhodium. As a material of the buffer film, a chromium-based materialis mainly used.

FIG. 6 shows a binary mask blank 50 in which a light-shielding film 51is formed on the underlayer 21 of the mask blank glass substrate 20 ofFIG. 3.

Although not illustrated, a phase shift mask blank is obtained byforming a phase shift film or a phase shift film and a light-shieldingfilm on the underlayer 21 of the mask blank glass substrate 20 of FIG.3.

The light-shielding film may be in the form of a single layer or aplurality of layers (e.g. laminated structure of a light-shielding layerand an antireflection layer). When the light-shielding film has thelaminated structure of the light-shielding layer and the antireflectionlayer, the light-shielding layer may have a structure comprising aplurality of layers. Likewise, the phase shift film may also be in theform of a single layer or a plurality of layers.

As such a mask blank, there can be cited, for example, a binary maskblank having a light-shielding film made of a material containingchromium (Cr), a binary mask blank having a light-shielding film made ofa material containing a transition metal and silicon (Si), a binary maskblank having a light-shielding film made of a material containingtantalum (Ta), or a phase shift mask blank having a phase shift filmmade of a material containing silicon (Si) or a material containing atransition metal and silicon (Si).

As the material containing chromium (Cr), there can be cited chromiumalone or a chromium-based material (e.g. CrO, CrN, CrC, CrON, CrCN,CrOC, or CrOCN).

As the material containing tantalum (Ta), there can be cited tantalumalone, a compound of tantalum and another metal element (e.g. Hf or Zr),or a material containing tantalum and at least one of nitrogen, oxygen,carbon, and boron, such as a material containing TaN, TaO, TaC, TaB,TaON, TaCN, TaBN, TaCO, TaBO, TaBC, TaCON, TaBON, TaBCN, or TaBCON.

As the material containing silicon (Si), there can be cited a materialcontaining silicon and at least one of nitrogen, oxygen, and carbon.Specifically, it is preferable to use a material containing siliconnitride, silicon oxide, silicon carbide, silicon oxynitride, siliconcarboxide, or silicon carboxynitride.

As the material containing a transition metal and silicon (Si), therecan be cited, other than a material containing a transition metal andsilicon, a material containing a transition metal and silicon andfurther containing at least one of nitrogen, oxygen, and carbon.Specifically, it is preferable to use a material containing a transitionmetal silicide, a transition metal silicide nitride, a transition metalsilicide oxide, a transition metal silicide carbide, a transition metalsilicide oxynitride, a transition metal silicide carboxide, or atransition metal silicide carboxynitride. As the transition metal, usecan be made of molybdenum, tantalum, tungsten, titanium, chromium,hafnium, nickel, vanadium, zirconium, ruthenium, rhodium, niobium, orthe like. Among them, molybdenum is particularly preferable.

[Mask]

This invention also provides a mask in which the thin film of the maskblank having the above-mentioned structure is patterned.

When a pattern defect that is difficult to correct is found, the maskhaving such a structure enables recycling of the glass substrate bystripping and removing the thin film, the underlayer, etc. from theglass substrate.

FIG. 7 shows a reflective mask 60 having an absorber film pattern 41 aobtained by patterning the absorber film 41 of the reflective mask blank40 of FIG. 5.

FIG. 8 shows a binary mask 70 having a light-shielding film pattern 51 aobtained by patterning the light-shielding film 51 of the binary maskblank 50 of FIG. 6.

As a method of patterning the thin film of the mask blank, thephotolithography is the most suitable.

Although not illustrated, in the case of the phase shift mask blankhaving the phase shift film or the phase shift film and thelight-shielding film on the underlayer of the above-mentioned mask blankglass substrate, a phase shift mask is obtained by patterning the phaseshift film.

In this invention, a defect inspection apparatus for obtaining defectinformation is not particularly limited. As a wavelength of inspectionlight for use in the defect inspection apparatus, 532 nm, 488 nm, 266nm, 193 nm, 13.5 nm, or the like is available.

EXAMPLES

Hereinbelow, the embodiments of this invention will be described infurther detail with reference to Examples.

Example 1 Surface Machining Process (SPR1)

A SiO₂—TiO₂-based glass substrate (size: about 152.4 mm×about 152.4 mm,thickness: about 6.35 mm) was prepared. Specifically, using adouble-side polishing machine, both front and back surfaces of the glasssubstrate were polished stepwise with cerium oxide abrasive particlesand colloidal silica abrasive particles and then treated withlow-concentration fluorosilicic acid. The surface roughness of theprepared glass substrate, measured by AFM (atomic force microscope), was0.25 nm in RMS (measurement region: 1 μm×1 μm).

The surface shape (flatness) of both front and back surfaces of theglass substrate was measured by a flatness measuring apparatus(UltraFlat: manufactured by Tropel Corporation) (measurement region: 148mm×148 mm).

As a result, the flatness of the front and back surfaces of the glasssubstrate was about 290 nm.

The surface shape (flatness) measurement results of the front and backsurfaces of the glass substrate were each stored in a computer as heightinformation with respect to a reference plane per measurement point.Using the computer, the measurement results were compared with a frontsurface flatness reference value of 100 nm or less and a back surfaceflatness reference value of 100 nm or less required for the glasssubstrate, thereby calculating differences (required removal amounts).

Then, a local surface machining condition according to the requiredremoval amount was set per machining spot shape region of the glasssubstrate.

Using a dummy substrate in advance, the dummy substrate was machined ina spot in the same manner as actual machining for a predetermined timewithout moving the dummy substrate and its shape was measured by thesame flatness measuring apparatus described above, thereby calculating amachining volume of the spot per unit time. Then, according to the spotinformation and the required removal amounts obtained by the surfaceshape information of the glass substrate, the scan speed for rasterscanning of the glass substrate was determined.

According to the set machining conditions, local surface machining wascarried out by the MRF (magnetorheological finishing) method using amagnetic-fluid substrate finishing apparatus so as to cause the flatnessof the front and back surfaces of the glass substrate to be theabove-mentioned reference value or less, thereby adjusting the surfaceshape of the glass substrate.

Cerium oxide was used as a polishing slurry.

Thereafter, the glass substrate was immersed in a cleaning bathcontaining a hydrochloric acid aqueous solution for about 10 minutes,then rinsed with pure water and dried with isopropyl alcohol (IPA).

The surface shape (flatness) of the front and back surfaces of the glasssubstrate was measured. As a result, in a 142 mm×142 mm measurementregion, the flatness of the front and back surfaces of the glasssubstrate was 80 nm and thus satisfied the target value of 100 nm orless.

<Underlayer Forming Process (SPR2)>

Then, using a B-doped Si target and using a mixed gas of Ar and He as asputtering gas, DC magnetron sputtering (sputtering described inJapanese Patent (JP-B) No. 4137667) was carried out to form a Siunderlayer having a thickness of 100 nm. Then, stress reductiontreatment was carried out by applying thermal energy to the Siunderlayer. The application of thermal energy may be carried out byapplying light energy using a xenon lamp or a halogen lamp or byhigh-temperature treatment using a high-temperature bath.

<Underlayer Precision Polishing Process (SPR3)>

Thereafter, in order to maintain the surface shape and to reduce thesurface roughness, a surface of the Si underlayer was precision-polishedusing a single-side polishing machine.

In this precision polishing, use was made of a polishing slurrycontaining a polishing abrasive of colloidal silica with an averageparticle size of 80 nm and adjusted to pH10 or more. The surface loadapplied to the surface of the Si underlayer was set to 50 g/cm² or lessand a suede pad was used as a polishing pad.

The surface shape (flatness) and the surface roughness of the surface ofthe Si underlayer were measured. As a result, in a 142 mm×142 mmmeasurement region, the flatness was 80 nm and thus satisfied the targetvalue of 100 nm or less. Further, in a 1 μm×1 μm measurement region, thesurface roughness was 0.08 nm in RMS and thus was excellent. Since thesurface of the Si underlayer has an extremely high smoothness of 0.1 nmor less in RMS, background noise in a highly sensitive defect inspectionapparatus is reduced, which is effective in terms of suppressing falsedefect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.60nm and thus Rmax/RMS was 7.5. Accordingly, variation in surfaceroughness was satisfactorily small.

<Underlayer Defect Inspection Process (SPR4)>

Then, the surface of the Si underlayer was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the Si underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 16,457, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

<Fiducial Mark Forming Process (SPR5)>

Then, a cross-shaped mark having a concave cross-sectional shape andhaving a predetermined size and width was formed at a predeterminedportion of the Si underlayer by the photolithography. The fiducial markwas formed in the following manner.

A resist for electron-beam writing was spin-coated on the Si underlayerand then baked, thereby forming a resist film having a thickness of 200nm. A fiducial mark was written on a predetermined portion of the resistfilm using an electron-beam writing apparatus and then development wascarried out, thereby forming a resist pattern. Using the resist patternas a mask, the Si underlayer was dry-etched with a fluorine-based gas(CF₄ gas), and then the resist film was removed by hot sulfuric acid,thereby forming a cross-shaped fiducial mark having a concavecross-sectional shape on the Si underlayer.

In this Example, as fiducial marks, rough alignment marks and fine markswere formed in the positional relationship as shown in FIG. 1. The roughalignment mark had a cross shape having a dimension of 0.55 mm, a linewidth of 5 μm, and a depth of 100 nm. The fine mark had a cross shapehaving a dimension of 0.1 mm, a line width of 5 μm, and a depth of 100nm.

In this manner, an EUV mask blank glass substrate was obtained.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

<Multilayer Reflective Film Forming Process (SPR6)>

Then, using an ion-beam sputtering apparatus, given that formation of aSi film (thickness: 4.2 nm) and a Mo film (thickness: 2.8 nm) formed onecycle, Si films and Mo films were laminated by 40 cycles to form amultilayer reflective film on the Si underlayer, thereby obtaining amultilayer reflective film coated substrate.

It was confirmed that the concave fiducial mark formed on the Siunderlayer was also formed on the multilayer reflective film and couldbe sufficiently detected by an electron-beam writing apparatus or a maskblank inspection apparatus.

<Multilayer Reflective Film Defect Inspection Process (SPR7)>

Then, a surface of the multilayer reflective film was subjected to adefect inspection using a mask blank defect inspection apparatus (MAGICSM1350: manufactured by Lasertec Corporation) (inspection region: 142mm×142 mm). As a result, the number of defects of the surface of themultilayer reflective film was 5, which was satisfactory. In this defectinspection, concave and convex defect position information using theabove-mentioned fiducial marks as references and defect size informationwere obtained. As a consequence, defect information in which themultilayer reflective film coated substrate and these defect positioninformation and defect size information were correlated with each otherwas obtained. The reflectance of the surface of the multilayerreflective film was evaluated by an EUV reflectometer. As a result,since variation in surface roughness of the underlayer was suppressed,the reflectance was 67%±0.2%, which was satisfactory.

With respect to the fiducial marks reflected and formed on the surfaceof the multilayer reflective film due to the fiducial marks formed onthe underlayer, it was confirmed by the mask/mask blank defectinspection apparatus that each fiducial mark exhibited a contrast of ashigh as 0.51 for inspection light and thus could be accurately detectedand further that it could be detected with high reproducibility becausevariation in defect detection position was as low as 90 nm. The contrastwas obtained by “contrast=(Imax−Imin)/(Imax+Imin)” where the defectinspection light intensity at the bottom of the fiducial mark was Iminand the defect inspection light intensity on the surface of themultilayer reflective film other than the fiducial mark portion wasImax. With respect to the variation in defect detection position, adefect inspection was carried out five times and the variation in defectdetection position was obtained from variation of detected defectpositions based on reference coordinates. Further, the surface of themultilayer reflective film was subjected to a defect inspection using amask/mask blank defect inspection apparatus (Teron 600: manufactured byKLA-Tencor Corporation) (inspection region: 132 mm×132 mm). As a result,the number of detected defects was 17,723, which was significantlyreduced as compared with a detected defect number of more than 100,000of later-described Reference Example. With the detected defect number onthis level, it is possible to detect the presence or absence of foreignmatter or a critical defect such as a crack.

<EUV Reflective Mask Blank Manufacturing Process (SPR8)>

Then, using a DC magnetron sputtering apparatus, a capping layer(thickness: 2.5 nm) made of RuNb and an absorber layer in the form of alaminate of a TaBN film (thickness: 56 nm) and a TaBO film (thickness:14 nm) were formed on the multilayer reflective film and, further, a CrNconductive film (thickness: 20 nm) was formed on the back side, therebyobtaining an EUV reflective mask blank.

Then, the obtained EUV reflective mask blank was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects of a surface of the EUVreflective mask blank was 7, which was satisfactory. In the same manneras described above, concave and convex defect position information usingthe above-mentioned fiducial marks as references and defect sizeinformation were obtained. As a consequence, defect information in whichthe EUV reflective mask blank and these defect position information anddefect size information were correlated with each other was obtained.Further, the surface of the EUV reflective mask blank was subjected to adefect inspection using a mask/mask blank defect inspection apparatus(Teron 600: manufactured by KLA-Tencor Corporation) (inspection region:132 mm×132 mm). As a result, the number of detected defects was 18,102,which was significantly reduced as compared with a detected defectnumber of more than 100,000 of later-described Reference Example. Withthe detected defect number on this level, it is possible to detect thepresence or absence of foreign matter or a critical defect such as acrack.

<EUV Reflective Mask Manufacturing Process (SPR9)>

Then, using the EUV reflective mask blank with the above-mentioneddefect information, an EUV reflective mask was manufactured.

First, a resist for electron-beam writing was spin-coated on the EUVreflective mask blank and then baked, thereby forming a resist film.

Then, based on the defect information of the EUV reflective mask blankand further based on mask pattern data designed in advance, a selectionwas made among correction to mask pattern data having no influence onpattern transfer using an exposure apparatus, correction to mask patterndata added with correction pattern data when judged to have an influenceon the pattern transfer, and correction to mask pattern data capable ofreducing the load of defect correction after the manufacture of a maskin the case of a defect not curable by correction pattern data. Based onthe corrected mask pattern data, a mask pattern was written on theresist film by an electron beam and then development was carried out,thereby forming a resist pattern.

Using the resist pattern as a mask, the TaBO film of the absorber layerwas etched with a fluorine-based gas (CF₄ gas) while the TaBN film ofthe absorber layer was etched with a chlorine-based gas (Cl₂ gas),thereby forming an absorber layer pattern on the capping layer.

Then, the resist pattern remaining on the absorber layer pattern wasremoved by hot sulfuric acid, thereby obtaining an EUV reflective mask.

Example 2

In Example 1, a CrN underlayer (Cr: 90 at %, N: 10 at %) having anamorphous crystal structure was used instead of the Si underlayer.Specifically, using a Cr target and using a mixed gas of Ar, He, and N₂as a sputtering gas, DC magnetron sputtering was carried out to form aCrN underlayer having a thickness of 100 nm.

A surface of the CrN underlayer was precision-polished in the samemanner as in Example 1. As a result, in a 142 mm×142 mm measurementregion, the flatness was 85 nm and thus satisfied the target value of100 nm or less. Further, in a 1 μm×1 μm measurement region, the surfaceroughness was 0.10 nm in RMS and thus was satisfactory.

Since the surface of the CrN underlayer has an extremely high smoothnessof 0.1 nm or less in RMS, background noise in a highly sensitive defectinspection apparatus is reduced, which is effective in terms ofsuppressing false defect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.95nm and thus Rmax/RMS was 9.5. Accordingly, variation in surfaceroughness was satisfactorily small.

Then, the surface of the CrN underlayer was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the CrN underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 24,744, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

Reference marks were formed on the CrN underlayer in the same manner asin Example 1 except that a mixed gas of Cl₂ and O₂ was used as anetching gas in dry etching using a resist pattern as a mask, therebymanufacturing an EUV mask blank glass substrate formed with the fiducialmarks.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

In the same manner as in Example 1, a multilayer reflective film wasformed on the CrN underlayer to manufacture a multilayer reflective filmcoated substrate and then a RuNb capping layer, an absorber layer in theform of a laminate of a TaBN film and a TaBO film, and a conductive filmwere formed, thereby obtaining an EUV reflective mask blank.

In the state of the multilayer reflective film coated substrate, thereflectance of a surface of the multilayer reflective film was evaluatedby an EUV reflectometer. As a result, like in Example 1, since variationin surface roughness of the underlayer was suppressed, the reflectancewas 67%±0.3%, which was satisfactory.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 1. As a result,with respect to each of the fiducial marks reflected and formed on thesurface of the multilayer reflective film, the contrast for inspectionlight was 0.52 and variation in defect detection position was 93 nmusing the mask/mask blank defect inspection apparatus, which wassatisfactory. Further, the surface of the multilayer reflective film anda surface of the EUV reflective mask blank were subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142 mm)and a mask/mask blank defect inspection apparatus (Teron 600:manufactured by KLA-Tencor Corporation) (inspection region: 132 mm×132mm). As a result, the number of defects and the number of detecteddefects were several and about 35,000, respectively. The number ofdetected defects was significantly reduced as compared with a detecteddefect number of more than 100,000 of later-described Reference Example.With the detected defect number on this level, it is possible to detectthe presence or absence of foreign matter or a critical defect such as acrack.

Further, an EUV reflective mask was manufactured using the EUVreflective mask blank. Like in Example 1, the EUV reflective mask blankand the EUV reflective mask were also satisfactorily manufactured.

Example 3

Next, a description will be given of an example where, in Example 2,defects are found in the defect inspection of the underlayer so that theunderlayer is stripped to recycle the glass substrate.

Since a number of defects having a size of 60 nm were detected in thedefect inspection of the surface of the CrN underlayer using the maskblank defect inspection apparatus (MAGICS M1350: manufactured byLasertec Corporation) (inspection region: 142 mm×142 mm), the CrNunderlayer was entirely dry-etched with a mixed gas of Cl₂ and O₂ to beremoved.

In this case, the SiO₂—TiO₂-based glass is not etched with the mixed gasof Cl₂ and O₂. Therefore, the surface roughness of the main surface ofthe glass substrate after stripping the CrN underlayer was measured tobe 0.4 nm in RMS. The flatness was 80 nm and thus was satisfactory.

After stripping the CrN underlayer, the glass substrate was cleaned withan alkaline aqueous solution and then a CrN underlayer was formed againon the main surface of the glass substrate. Thereafter, a surface of theCrN underlayer was precision-polished in the same manner as in Example2. The flatness and the surface roughness of the surface of the CrNunderlayer were measured. As a result, in a 142 mm×142 mm measurementregion, the flatness was 85 nm and thus satisfied the target value of100 nm or less. Further, in a 1 μm×1 μm measurement region, the surfaceroughness was 0.10 nm in RMS and thus was satisfactory.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.96nm and thus Rmax/RMS was 9.6. Accordingly, variation in surfaceroughness was satisfactorily small.

Then, the surface of the CrN underlayer was again subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the CrN underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 27,902, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

Thereafter, fiducial marks, a multilayer reflective film, a cappinglayer, an absorber layer, and a conductive film were formed in the samemanner as in Example 2, thereby obtaining an EUV reflective mask blank.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 2. As a result,the same results as those in Example 2 were obtained. Further, a surfaceof the multilayer reflective film and a surface of the EUV reflectivemask blank were subjected to a defect inspection using a mask blankdefect inspection apparatus (MAGICS M1350: manufactured by LasertecCorporation) (inspection region: 142 mm×142 mm) and a mask/mask blankdefect inspection apparatus (Teron 600: manufactured by KLA-TencorCorporation) (inspection region: 132 mm×132 mm). As a result, the numberof defects and the number of detected defects were several and about37,000, respectively. The number of detected defects was significantlyreduced as compared with a detected defect number of more than 100,000of later-described Reference Example. With the detected defect number onthis level, it is possible to detect the presence or absence of foreignmatter or a critical defect such as a crack.

In Example 3, this invention has been described by citing the example inwhich the glass substrate with the underlayer was judged to beunsuccessful in the defect inspection of the surface of the underlayer.But, this invention is not limited thereto. It is needless to say thatthis invention is also applicable to recycling of the glass substratewhen the specification of the fiducial marks was not satisfied in thefiducial mark forming process.

Example 4

In Example 1, a laminated underlayer comprising a CrN layer (Cr: 90 at%, N: 10 at %) having an amorphous crystal structure and a Si layer wasused instead of the Si underlayer. Specifically, first, using a Crtarget and using a mixed gas of Ar, He, and N₂ as a sputtering gas, DCmagnetron sputtering was carried out to form a CrN layer having athickness of 5 nm. Subsequently, using a B-doped Si target and using amixed gas of Ar and He as a sputtering gas, DC magnetron sputtering wascarried out to form a Si layer having a thickness of 100 nm. In thismanner, a laminated underlayer of the CrN layer and the Si layer wasformed.

Since the film stress of the CrN layer should be as small as possibleand should prevent an increase in surface roughness of the Si layerformed as its upper layer, the crystal structure of the CrN layer ispreferably amorphous and its thickness is preferably as small aspossible. On the other hand, in order to achieve a function of anetching stopper that prevents damage to the glass substrate whenfiducial marks are formed on the upper Si layer by fluorine-based dryetching, a certain thickness is required. From this point of view, thethickness of the CrN layer is set to 2 nm to 20 nm, preferably 3 nm to15 nm.

A surface of the laminated underlayer of the CrN layer and the Si layerwas precision-polished in the same manner as in Example 1. As a result,in a 142 mm×142 mm measurement region, the flatness was 85 nm and thussatisfied the target value of 100 nm or less. Further, in a 1 μm×1 μmmeasurement region, the surface roughness was 0.08 nm in RMS and thuswas excellent.

Since the surface of the laminated underlayer has an extremely highsmoothness of 0.08 nm or less in RMS, background noise in a highlysensitive defect inspection apparatus is reduced, which is effective interms of suppressing false defect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.50nm and thus Rmax/RMS was 6.25. Accordingly, variation in surfaceroughness was satisfactorily small.

Then, the surface of the laminated underlayer of the CrN layer and theSi layer was subjected to a defect inspection using a mask blank defectinspection apparatus (MAGICS M1350: manufactured by LasertecCorporation) (inspection region: 142 mm×142 mm). As a result, the numberof defects having a size of 60 nm was zero, which was satisfactory.Further, the surface of the laminated underlayer was subjected to adefect inspection using a mask/mask blank defect inspection apparatus(Teron 600: manufactured by KLA-Tencor Corporation) (inspection region:132 mm×132 mm). As a result, the number of detected defects was 15,013,which was significantly reduced as compared with a detected defectnumber of more than 100,000 of later-described Reference Example. Withthe detected defect number on this level, it is possible to detect thepresence or absence of foreign matter or a critical defect such as acrack.

Reference marks were formed on the laminated underlayer of the CrN layerand the Si layer in the same manner as in Example 1 except that thefiducial marks (depth: 100 nm) were formed on the upper Si layer by dryetching with a fluorine-based gas using a resist pattern as a mask,thereby manufacturing an EUV mask blank glass substrate formed with thefiducial marks.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

In the same manner as in Example 1, a multilayer reflective film wasformed on the laminated underlayer of the CrN layer and the Si layer tomanufacture a multilayer reflective film coated substrate and then aRuNb capping layer, an absorber layer in the form of a laminate of aTaBN film and a TaBO film, and a conductive film were formed, therebyobtaining an EUV reflective mask blank.

In the state of the multilayer reflective film coated substrate, thereflectance of a surface of the multilayer reflective film was evaluatedby an EUV reflectometer. As a result, like in Example 1, since variationin surface roughness of the underlayer was suppressed, the reflectancewas 67%±0.15%, which was satisfactory.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 1. As a result,with respect to each of the fiducial marks reflected and formed on thesurface of the multilayer reflective film, the contrast for inspectionlight was 0.50 and variation in defect detection position was 90 nmusing the mask/mask blank defect inspection apparatus, which wassatisfactory. Further, the surface of the multilayer reflective film anda surface of the EUV reflective mask blank were subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142 mm)and a mask/mask blank defect inspection apparatus (Teron 600:manufactured by KLA-Tencor Corporation) (inspection region: 132 mm×132mm). As a result, the number of defects and the number of detecteddefects were several and about 16,000, respectively. The number ofdetected defects was significantly reduced as compared with a detecteddefect number of more than 100,000 of later-described Reference Example.With the detected defect number on this level, it is possible to detectthe presence or absence of foreign matter or a critical defect such as acrack.

Further, an EUV reflective mask was manufactured using the EUVreflective mask blank. Like in Example 1, the EUV reflective mask blankand the EUV reflective mask were also satisfactorily manufactured.

Example 5

A synthetic quartz substrate (size: about 152.4 mm×about 152.4 mm,thickness: about 6.35 mm) was prepared. Specifically, using adouble-side polishing machine, both front and back surfaces of the glasssubstrate were polished stepwise with cerium oxide abrasive particlesand colloidal silica abrasive particles and then treated withlow-concentration fluorosilicic acid. The surface roughness of theprepared glass substrate was 0.2 nm in RMS. The flatness of the frontand back surfaces of the glass substrate was about 290 nm.

Thereafter, the surface machining process was carried out in the samemanner as in Example 1.

Then, using a Si target and using a mixed gas of Ar, O₂, and N₂ as asputtering gas, DC magnetron sputtering was carried out to form a SiONunderlayer having a thickness of 100 nm on the obtained glass substrate.The composition of the SiON underlayer was Si: 40 at %, O: 27 at %, andN: 33 at %.

A surface of the SiON underlayer was precision-polished in the samemanner as in Example 1. As a result, in a 142 mm×142 mm measurementregion, the flatness was 85 nm and thus satisfied the target value of100 nm or less. Further, in a 1 μm×1 μm measurement region, the surfaceroughness was 0.10 nm in RMS and thus was satisfactory.

Since the surface of the CrN underlayer has an extremely high smoothnessof 0.1 nm or less in RMS, background noise in a highly sensitive defectinspection apparatus is reduced, which is effective in terms ofsuppressing false defect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 1.00nm and thus Rmax/RMS was 10. Accordingly, variation in surface roughnesswas satisfactorily small.

Then, the surface of the SiON underlayer was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the SiON underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 29,563, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

Reference marks were formed on the SiON underlayer in the same manner asin Example 1, thereby manufacturing a binary mask blank glass substrateformed with the fiducial marks.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

Then, on the SiON underlayer, a light-shielding film in the form of alaminate of a TaN film and a TaO film was formed in the followingmanner.

Specifically, first, using a tantalum (Ta) target, reactive sputtering(DC sputtering) was carried out by setting the power of a DC powersupply to 1.5 kW in a mixed gas atmosphere of xenon (Xe) and nitrogen(N₂) (gas pressure 0.076 Pa, gas flow rate ratio Xe:N₂=11 sccm:15 sccm),thereby forming a TaN film having a thickness of 44.9 nm. Subsequently,using a Ta target, reactive sputtering (DC sputtering) was carried outby setting the power of a DC power supply to 0.7 kW in a mixed gasatmosphere of argon (Ar) and oxygen (O₂) (gas pressure 0.3 Pa, gas flowrate ratio Ar:O₂=58 sccm:32.5 sccm), thereby forming a TaO film having athickness of 13 nm. In this manner, a light-shielding film for ArFexcimer laser light (wavelength: 193 nm) in the form of the laminate ofthe TaN film and the TaO film was formed on the SiON underlayer, therebymanufacturing a binary mask blank. The light-shielding film had anoptical density of 3.0 for ArF excimer laser light and had afront-surface reflectance of 19.5%.

Then, the obtained binary mask blank was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). Concave and convex defect position information using the fiducialmarks formed on the underlayer as references and defect size informationwere obtained. As a consequence, defect information in which the binarymask blank and these defect position information and defect sizeinformation were correlated with each other was obtained. The contrastof the fiducial mark and variation in defect detection position wereevaluated in the same manner as in Example 1. As a result, with respectto each of the fiducial marks reflected and formed on a surface of thelight-shielding film or the binary mask blank, the contrast forinspection light was 0.55 and variation in defect detection position was92 nm using the mask/mask blank defect inspection apparatus, which wassatisfactory. Further, the surface of the binary mask blank wassubjected to a defect inspection using a mask blank defect inspectionapparatus (MAGICS M1350: manufactured by Lasertec Corporation)(inspection region: 142 mm×142 mm) and a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of defectsand the number of detected defects were several and about 40,000,respectively. The number of detected defects was significantly reducedas compared with a detected defect number of more than 100,000 oflater-described Reference Example. With the detected defect number onthis level, it is possible to detect the presence or absence of foreignmatter or a critical defect such as a crack.

Then, using the binary mask blank with the above-mentioned defectinformation, a binary mask was manufactured.

First, a resist for electron-beam writing was spin-coated on the binarymask blank and then baked, thereby forming a resist film.

Then, like in Example 1, based on the defect information of the binarymask blank and further based on mask pattern data designed in advance, aselection was made among correction to mask pattern data having noinfluence on pattern transfer using an exposure apparatus, correction tomask pattern data added with correction pattern data when judged to havean influence on the pattern transfer, and correction to mask patterndata capable of reducing the load of defect correction after themanufacture of a mask in the case of a defect not curable by correctionpattern data. Based on the corrected mask pattern data, a mask patternwas written on the resist film by an electron beam and then developmentwas carried out, thereby forming a resist pattern.

Using the resist pattern as a mask, the TaO film was etched with afluorine-based gas (CF₄ gas) while the TaN film was etched with achlorine-based gas (Cl₂ gas), thereby forming a light-shielding filmpattern.

Then, the resist pattern remaining on the light-shielding film patternwas removed by hot sulfuric acid, thereby obtaining a binary mask.

Example 6

In Example 1, a TaBN underlayer (Ta: 80 at %, B: 10 at %, N: 10 at %)was used instead of the Si underlayer. Specifically, using a TaB targetand using a mixed gas of Ar and N₂ as a sputtering gas, DC magnetronsputtering was carried out to form a TaBN underlayer having a thicknessof 150 nm.

A surface of the TaBN underlayer was precision-polished in the samemanner as in Example 1. As a result, in a 142 mm×142 mm measurementregion, the flatness was 85 nm and thus satisfied the target value of100 nm or less. Further, in a 1 μm×1 μm measurement region, the surfaceroughness was 0.085 nm in RMS and thus was excellent.

Since the surface of the TaBN underlayer has an extremely highsmoothness of 0.1 nm or less in RMS, background noise in a highlysensitive defect inspection apparatus is reduced, which is effective interms of suppressing false defect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.8nm and thus Rmax/RMS was 9.4. Accordingly, variation in surfaceroughness was satisfactorily small.

Then, the surface of the TaBN underlayer was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the TaBN underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 19,337, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

Reference marks were formed on the TaBN underlayer in the same manner asin Example 1 except that FIB (focused ion beam) was used, therebymanufacturing an EUV mask blank glass substrate formed with the fiducialmarks.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

In the same manner as in Example 1, a multilayer reflective film wasformed on the TaBN underlayer to manufacture a multilayer reflectivefilm coated substrate and then a RuNb capping layer, an absorber layerin the form of a laminate of a TaBN film and a TaBO film, and aconductive film were formed, thereby obtaining an EUV reflective maskblank.

In the state of the multilayer reflective film coated substrate, thereflectance of a surface of the multilayer reflective film was evaluatedby an EUV reflectometer. As a result, like in Example 1, since variationin surface roughness of the underlayer was suppressed, the reflectancewas 67%±0.25%, which was satisfactory.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 1. As a result,with respect to each of the fiducial marks reflected and formed on thesurface of the multilayer reflective film, the contrast for inspectionlight was 0.51 and variation in defect detection position was 92 nmusing the mask/mask blank defect inspection apparatus, which wassatisfactory. Further, the surface of the multilayer reflective film anda surface of the EUV reflective mask blank were subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142 mm)and a mask/mask blank defect inspection apparatus (Teron 600:manufactured by KLA-Tencor Corporation) (inspection region: 132 mm×132mm). As a result, the number of defects and the number of detecteddefects were several and about 25,000, respectively. The number ofdetected defects was significantly reduced as compared with a detecteddefect number of more than 100,000 of later-described Reference Example.With the detected defect number on this level, it is possible to detectthe presence or absence of foreign matter or a critical defect such as acrack.

Further, an EUV reflective mask was manufactured using the EUVreflective mask blank. Like in Example 1, the EUV reflective mask blankand the EUV reflective mask were also satisfactorily manufactured.

Example 7

In Example 1, ion-beam sputtering was carried out to form a Siunderlayer having a thickness of 100 nm.

A surface of the Si underlayer was precision-polished in the same manneras in Example 1. As a result, in a 142 mm×142 mm measurement region, theflatness was 85 nm and thus satisfied the target value of 100 nm orless. Further, in a 1 μm×1 μm measurement region, the surface roughnesswas 0.08 nm in RMS and thus was excellent.

Since the surface of the Si underlayer has an extremely high smoothnessof 0.08 nm in RMS, background noise in a highly sensitive defectinspection apparatus is reduced, which is effective in terms ofsuppressing false defect detection.

Further, in a 1 μm×1 μm measurement region, the maximum surfaceroughness (namely, surface roughness in maximum height) (Rmax) was 0.55nm and thus Rmax/RMS was 6.88. Accordingly, variation in surfaceroughness was satisfactorily small. The reason that the surfaceroughness and variation in surface roughness were better than Example 1is presumably because since the Si film was formed under higher vacuumby ion-beam sputtering than by DC magnetron sputtering, the film with ahigher density was formed.

Then, the surface of the Si underlayer was subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142mm). As a result, the number of defects having a size of 60 nm was zero,which was satisfactory. Further, the surface of the Si underlayer wassubjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects was 15,744, which was significantly reduced as compared with adetected defect number of more than 100,000 of later-described ReferenceExample. With the detected defect number on this level, it is possibleto detect the presence or absence of foreign matter or a critical defectsuch as a crack.

Reference marks were formed on the Si underlayer in the same manner asin Example 1 except that FIB (focused ion beam) was used, therebymanufacturing an EUV mask blank glass substrate formed with the fiducialmarks.

The cross-sectional shape of each fiducial mark was observed by AFM. Asa result, the cross-section was substantially upright, which wassatisfactory.

In the same manner as in Example 1, a multilayer reflective film wasformed on the Si underlayer to manufacture a multilayer reflective filmcoated substrate and then a RuNb capping layer, an absorber layer in theform of a laminate of a TaBN film and a TaBO film, and a conductive filmwere formed, thereby obtaining an EUV reflective mask blank.

In the state of the multilayer reflective film coated substrate, thereflectance of a surface of the multilayer reflective film was evaluatedby an EUV reflectometer. As a result, like in Example 1, since variationin surface roughness of the underlayer was suppressed, the reflectancewas 67%±0.2%, which was satisfactory.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 1. As a result,with respect to each of the fiducial marks reflected and formed on thesurface of the multilayer reflective film, the contrast for inspectionlight was 0.51 and variation in defect detection position was 90 nmusing the mask/mask blank defect inspection apparatus, which wassatisfactory. Further, the surface of the multilayer reflective film anda surface of the EUV reflective mask blank were subjected to a defectinspection using a mask blank defect inspection apparatus (MAGICS M1350:manufactured by Lasertec Corporation) (inspection region: 142 mm×142 mm)and a mask/mask blank defect inspection apparatus (Teron 600:manufactured by KLA-Tencor Corporation) (inspection region: 132 mm×132mm). As a result, the number of defects and the number of detecteddefects were several and about 16,000, respectively. The number ofdetected defects was significantly reduced as compared with a detecteddefect number of more than 100,000 of later-described Reference Example.With the detected defect number on this level, it is possible to detectthe presence or absence of foreign matter or a critical defect such as acrack.

Further, an EUV reflective mask was manufactured using the EUVreflective mask blank. Like in Example 1, the EUV reflective mask blankand the EUV reflective mask were also satisfactorily manufactured.

Reference Example

There was prepared a SiO₂—TiO₂-based glass substrate (size: about 152.4mm×about 152.4 mm, thickness: about 6.35 mm) having been subjected tothe surface machining process in the same manner as in Example 1. In a 1μm×1 μm measurement region, the surface roughness of the prepared glasssubstrate was 0.15 nm in RMS and 1.78 nm in Rmax. The flatness of frontand back surfaces of the glass substrate was about 290 nm.

Then, on the main surface (front surface) of the glass substrate, a thinfilm for mark formation made of CrOCN (Cr:O:C:N=33:36:20:11 in at %ratio) was formed to a thickness of 10 nm by sputtering.

A resist for electron-beam writing was spin-coated on the mark-formationthin film and then baked, thereby forming a resist film having athickness of 300 nm. Reference marks were written on predeterminedportions of the resist film using an electron-beam writing apparatus andthen development was carried out, thereby forming a resist pattern.Using the resist pattern as a mask, the mark-formation thin film wasdry-etched with a mixed gas of chlorine and oxygen, thereby transferringpatterns of the fiducial marks to the mark-formation thin film to obtaina mask-formation thin film pattern. Further, using this mark-formationthin film pattern as a mask, the glass substrate was dry-etched with amixed gas of fluorine-based gas (CF₄ gas) and He gas. The remainingmark-formation thin film pattern was removed by etching with a mixed gasof chlorine and oxygen. In this manner, the fiducial marks were formeddirectly on the main surface of the glass substrate.

The surface roughness of the obtained glass substrate was measured. As aresult, in a 1 μm×1 μm measurement region, the surface roughness was0.16 nm in RMS and 1.95 nm in Rmax. In this Reference Example, becauseof being the SiO₂—TiO₂-based glass substrate, it was difficult toachieve a high smoothness of 0.1 nm or less in RMS. There is apossibility that background noise due to the surface roughness occurs toincrease false defect detection in a highly sensitive defect inspection.In fact, as a result of carrying out a defect inspection of a surface ofthe CrOCN mark-formation thin film in the same manner as in Example 1using a mask/mask blank defect inspection apparatus (Teron 600:manufactured by KLA-Tencor Corporation) (inspection region: 132 mm×132mm), the number of detected defects exceeded 100,000 so that it was notpossible to inspect the presence or absence of foreign matter or acritical defect such as a crack. Further, since the fiducial marks areformed directly on the glass substrate, it is difficult to recycle theglass substrate after the formation of the fiducial marks.

Further, Rmax/RMS was 12.2 and thus was a large value as compared withthose of the Examples described above. A multilayer reflective film wasformed on the main surface of the glass substrate in the same manner asin Example 1 and then the reflectance of a surface of the multilayerreflective film was evaluated by an EUV reflectometer. As a result, thereflectance was 66%±0.35%, which was worse as compared with the Examplesdescribed above.

The contrast of the fiducial marks and variation in defect detectionposition were evaluated in the same manner as in Example 1. As a result,with respect to each of the fiducial marks reflected and formed on thesurface of the multilayer reflective film, the contrast for inspectionlight was 0.48 and variation in defect detection position was 92 nmusing the mask/mask blank defect inspection apparatus, which wassubstantially the same as in Example 1. Further, the surface of themultilayer reflective film and a surface of an EUV reflective mask blankwere subjected to a defect inspection using a mask/mask blank defectinspection apparatus (Teron 600: manufactured by KLA-Tencor Corporation)(inspection region: 132 mm×132 mm). As a result, the number of detecteddefects exceeded 100,000 so that it was not possible to inspect thepresence or absence of foreign matter or a critical defect such as acrack.

In the above-mentioned Examples, the fiducial marks were formed by thephotolithography. However, this invention is not limited thereto. Asdescribed before, when the cross-sectional shape of a fiducial mark isconcave, the fiducial mark can be formed by recess formation by laserlight or an ion beam, machining trace by scanning a diamond stylus,indention by a micro-indenter, stamping by an imprint method, or thelike. When the cross-sectional shape of a fiducial mark is convex, thefiducial mark can be formed by partial film formation by FIB,sputtering, or the like. In addition, although the above description hasbeen made only about a glass substrate, the substrate may not always berestricted to the glass substrate.

What is claimed is:
 1. A mask blank substrate comprising: a substratethat has a main surface; and an underlayer that is formed on the mainsurface; wherein the underlayer has a surface in which a ratio ofRmax/RMS falls within a range of 2 to 10, where Rmax represents amaximum surface roughness and RMS represents a root mean surfaceroughness.
 2. The mask blank substrate according to claim 1, wherein thesurface of the underlayer has a root mean square roughness (RMS) of 0.15nm or less.
 3. The mask blank substrate according to claim 1, whereinthe underlayer is made of Si or a silicon compound containing Si.
 4. Themask blank substrate according to claim 1, wherein the underlayer ismade of a material that is etchable by the use of a chlorine-based gas.5. The mask blank substrate according to claim 4, wherein the underlayeris made of Al, Ta, Zr, Ti, Cr, or a material containing at least one ofthem.
 6. The mask blank substrate according to claim 1, wherein theunderlayer has a fiducial mark to provide a reference for a defectposition in defect information.
 7. The mask blank substrate according toclaim 1, wherein the underlayer has a thickness falling within a rangeof 20 nm to 300 nm.
 8. The mask blank substrate according to claim 1,wherein the glass substrate is made of a SiO2-TiO2-based glass or amulticomponent glass-ceramic.
 9. A multilayer reflective film coatedsubstrate, wherein a multilayer reflective film adapted to reflect EUVlight is formed on the underlayer of the mask blank substrate accordingto claim
 1. 10. The multilayer reflective film coated substrateaccording to claim 9, wherein a protective film is formed on themultilayer reflective film.
 11. A mask blank, wherein a thin film to bea transfer pattern is formed on the multilayer reflective film of themultilayer reflective film coated substrate according to claim
 9. 12. Amask blank, wherein a thin film to be a transfer pattern is formed onthe protective film of the multilayer reflective film coated substrateaccording to claim
 10. 13. A mask comprising a transfer pattern that islocated on the multilayer reflective film of the multilayer reflectivefilm coated substrate according to claim
 9. 14. A mask comprising atransfer pattern that is located on the protective film of themultilayer reflective film coated substrate according to claim
 10. 15. Amask blank, wherein a thin film to be a transfer pattern is formed onthe underlayer of the mask blank substrate according to claim
 1. 16. Amask comprising a transfer pattern that is located on the underlayer ofthe mask blank substrate according to claim 1.